Thin Film Micro-Optics

"Thin-film microoptics" stands for novel types of microoptical components and systems which combine the well-known features of miniaturized optical elements with the specific advantages of thin optical layers. This approach enables for innovative solutions in shaping light fields in spatial, temporal and spectral domain. Low-dispersion and small-angle systems for tailoring and diagnosing laser pulses under extreme conditions as well as VUV-capable microoptics can be realized. Continuous-relief microstructures of refractive, reflective and hybrid characteristics are obtained by vapor deposition technologies with shadow masks in rotating systems. The book gives a comprehensive overview on fundamental laws of microoptics, types of thin-film microoptical components, methods and constraints of their design, fabrication and characterization, structure transfer into substrates, optical functions and applications. Recent theoretical and experimental results of basic and applied research are addressed. Particular emphasis will be laid on the generation of localized, nondiffracting few-cycle wavepackets of extended depth of focus and high tolerance against distortions. It is shown that the spectral interference of ultrabroadband conical beams results in spatio-temporal structures of characteristic X-shape, so-called X-waves, which are interesting for robust optical communication. New prospects are opened by exploiting small conical angles from nanolayer microoptics and self-apodized truncation of Bessel beams leading to the formation of single-maximum nondiffracting beams or "needle beams". Thin-film microoptical beam shapers have an enormous potential for future applications like the two-dimensional ultrafast optical processing, multichannel laser-matter interaction, nonlinear spectroscopy or advanced measuring techniques. - Introduces a new and promising branch of microoptics - Gives a compact overview on the types, properties and applications of the most important microoptical components containing valuable data and facts - Helps to understand the basic optical laws - Reports on the historical development line of thin-film microoptics - Provides brand new results of research and development in the field of ultrashort-pulse laser beam shaping and diagnostics - Discusses the future trends and first approaches of next generation microoptics - Contains a carefully assorted glossary of the most important technical terms

From optical fundamentals to advanced applications, this comprehensive guide to micro-optics covers all the key areas for those who need an in-depth introduction to micro-optic devices, technologies, and applications. Topics covered range from basic optics, optical materials, refraction, and diffraction, to micro-mirrors, micro-lenses, diffractive optics, optoelectronics, and fabrication. Advanced topics, such as tunable and nano-optics, are also discussed. Real-world case studies and numerous worked examples are provided throughout, making complex concepts easier to follow, whilst an extensive bibliography provides a valuable resource for further study. With exercises provided at the end of each chapter to aid and test understanding, this is an ideal textbook for graduate and advanced undergraduate students taking courses in optics, photonics, micro-optics, microsystems, and MEMs. It is also a useful self-study guide for research engineers working on optics development.

This work presents advances in thin films for applications in the fields of integrated optics, micro-optics, optical telecommunications and optoelectronics. It delineates the performance characteristics needed for graded coatings, damage-resistant laser coatings and many others. Basic theory and applications are illustrated.

Practical, user-oriented reference for engineers who must incorporate and specify coatings for filters, antiglare effects, polarization, or other purposes in optical or electro-optical systems design. It focuses on preparation techniques and characteristics of commercially available products and provides information needed to determine what type of filter is needed to solve a particular problem, what its limitations are, and how to care for it.

The Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and Applications, Second Edition explores the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition. This second edition explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of submicron dimensions. The book covers PVD, laser and E-beam assisted deposition, MBE, and ion beam methods to bring together all of the physical vapor deposition techniques. The book also includes coverage of chemical mechanical polishing that helps attain the flatness that is required by modern lithography methods and new materials used for interconnect dielectric materials, specifically organic polyimide materials.

This text examines the technology behind the plethora of modern industrial and domestic technologies which incorporate micro-optics eg. CDs, cameras, automated manufacturing systems, mobile communications etc. It includes a simple but comprehensive introduction to micro-optical developments design, and an overview of fabrication and replication technology. The theoretical, practical and industrial developments in micro-scale optoelectronics continue apace in the late 1990s. In this book, a distinguished group of physicists and engineers describe the current state of research and applications in micro-optics. It provides the theoretical background and an overview of current technology, with several chapters taking a deeper look at specific recent applications and future trends. The book concentrates on diffractive and refractive micro- optical elements, such as lenses, fan-out gratings, optimized phase elements and polarisers. Sections are included on the simulation and optimization of design for micro-optics and subsequently the efficient transformation from design to real optical elements, using techniques such as e-beam writing, laser beam writing, lithography, etching and thin film deposition.

Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

A theoretical, self-contained study of periodic multilayers and how they can be effectively exploited in both traditional and modern applications.

Thin film technology is used in many applications such as microelectronics, optics, hard and corrosion resistant coatings and micromechanics, and thin films form a uniquely versatile material base for the development of novel technologies within these industries. Thin film growth provides an important and up-to-date review of the theory and deposition techniques used in the formation of thin films. Part one focuses on the theory of thin film growth, with chapters covering nucleation and growth processes in thin films, phase-field modelling of thin film growth and surface roughness evolution. Part two covers some of the techniques used for thin film growth, including oblique angle deposition, reactive magnetron sputtering and epitaxial growth of graphene films on single crystal metal surfaces. This section also includes chapters on the properties of thin films, covering topics such as substrate plasticity and buckling of thin films, polarity control, nanostructure growth dynamics and network behaviour in thin films. With its distinguished editor and international team of contributors, Thin film growth is an essential reference for engineers in electronics, energy materials and mechanical engineering, as well as those with an academic research interest in the topic. Provides an important and up-to-date review of the theory and deposition techniques used in the formation of thin films Focusses on the theory and modelling of thin film growth, techniques and mechanisms used for thin film growth and properties of thin films An essential reference for engineers in electronics, energy materials and mechanical engineering

This text presents several new thin-film design methods that can produce multiple stopbands as well as passbands. It is written for thin-film designers and students with advanced knowledge of multilayer, optical thin-film coatings. The text focuses on coatings that have high reflectance performance requirements in more than one spectral wavelength band or region. Relatively basic exercises are provided for students as well as challenging ones for researchers.

This text aims at providing a comprehensive and up to date treatment of the new and rapidly expanding field of laser pro cessing of thin films, particularly, though by no means exclu sively, of recent progress in the dielectrics area. The volume covers all the major aspects of laser processing technology in general, from the background and history to its many potential applications, and from the theory to the necessary experimental considerations. It highlights and compares the vast array of processing conditions now available with intense photon beams, as well as the properties of the films and microstructures pro duced. Separate chapters deal with the fundamentals of laser interactions with matter, and with experimental considerations. Detailed consideration is also given to film deposition, nuclea tion and growth, oxidation and annealing, as well as selective and localized. etching and ablation, not only in terms of the various photon-induced processes, but also with respect to traditional as well as other competing new technologies.