Sputtering Materials for VLSI and Thin Film Devices

Sputtering Materials for VLSI and Thin Film Devices
Author: Jaydeep Sarkar
Publsiher: William Andrew
Total Pages: 608
Release: 2010-12-13
ISBN 10: 0815519877
ISBN 13: 9780815519874
Language: EN, FR, DE, ES & NL

Sputtering Materials for VLSI and Thin Film Devices Book Review:

An important resource for students, engineers and researchers working in the area of thin film deposition using physical vapor deposition (e.g. sputtering) for semiconductor, liquid crystal displays, high density recording media and photovoltaic device (e.g. thin film solar cell) manufacturing. This book also reviews microelectronics industry topics such as history of inventions and technology trends, recent developments in sputtering technologies, manufacturing steps that require sputtering of thin films, the properties of thin films and the role of sputtering target performance on overall productivity of various processes. Two unique chapters of this book deal with productivity and troubleshooting issues. The content of the book has been divided into two sections: (a) the first section (Chapter 1 to Chapter 3) has been prepared for the readers from a range of disciplines (e.g. electrical, chemical, chemistry, physics) trying to get an insight into use of sputtered films in various devices (e.g. semiconductor, display, photovoltaic, data storage), basic of sputtering and performance of sputtering target in relation to productivity, and (b) the second section (Chapter 4 to Chapter 8) has been prepared for readers who already have background knowledge of sputter deposition of thin films, materials science principles and interested in the details of sputtering target manufacturing methods, sputtering behavior and thin film properties specific to semiconductor, liquid crystal display, photovoltaic and magnetic data storage applications. In Chapters 5 to 8, a general structure has been used, i.e. a description of the applications of sputtered thin films, sputtering target manufacturing methods (including flow charts), sputtering behavior of targets (e.g. current - voltage relationship, deposition rate) and thin film properties (e.g. microstructure, stresses, electrical properties, in-film particles). While discussing these topics, attempts have been made to include examples from the actual commercial processes to highlight the increased complexity of the commercial processes with the growth of advanced technologies. In addition to personnel working in industry setting, university researchers with advanced knowledge of sputtering would also find discussion of such topics (e.g. attributes of target design, chamber design, target microstructure, sputter surface characteristics, various troubleshooting issues) useful. . Unique coverage of sputtering target manufacturing methods in the light of semiconductor, displays, data storage and photovoltaic industry requirements Practical information on technology trends, role of sputtering and major OEMs Discussion on properties of a wide variety of thin films which include silicides, conductors, diffusion barriers, transparent conducting oxides, magnetic films etc. Practical case-studies on target performance and troubleshooting Essential technological information for students, engineers and scientists working in the semiconductor, display, data storage and photovoltaic industry

Modern Technologies for Creating the Thin film Systems and Coatings

Modern Technologies for Creating the Thin film Systems and Coatings
Author: Nikolay Nikitenkov
Publsiher: BoD – Books on Demand
Total Pages: 444
Release: 2017-03-08
ISBN 10: 953513003X
ISBN 13: 9789535130031
Language: EN, FR, DE, ES & NL

Modern Technologies for Creating the Thin film Systems and Coatings Book Review:

Development of the thin film and coating technologies (TFCT) made possible the technological revolution in electronics and through it the revolution in IT and communications in the end of the twentieth century. Now, TFCT penetrated in many sectors of human life and industry: biology and medicine; nuclear, fusion, and hydrogen energy; protection against corrosion and hydrogen embrittlement; jet engine; space materials science; and many others. Currently, TFCT along with nanotechnologies is the most promising for the development of almost all industries. The 20 chapters of this book present the achievements of thin-film technology in many areas mentioned above but more than any other in medicine and biology and energy saving and energy efficiency.

The Foundations of Vacuum Coating Technology

The Foundations of Vacuum Coating Technology
Author: Donald M. Mattox
Publsiher: William Andrew
Total Pages: 378
Release: 2018-08-21
ISBN 10: 0128130857
ISBN 13: 9780128130858
Language: EN, FR, DE, ES & NL

The Foundations of Vacuum Coating Technology Book Review:

The Foundations of Vacuum Coating Technology, Second Edition, is a revised and expanded version of the first edition, which was published in 2003. The book reviews the histories of the various vacuum coating technologies and expands on the history of the enabling technologies of vacuum technology, plasma technology, power supplies, and low-pressure plasma-enhanced chemical vapor deposition. The melding of these technologies has resulted in new processes and products that have greatly expanded the application of vacuum coatings for use in our everyday lives. The book is unique in that it makes extensive reference to the patent literature (mostly US) and how it relates to the history of vacuum coating. The book includes a Historical Timeline of Vacuum Coating Technology and a Historical Timeline of Vacuum/Plasma Technology, as well as a Glossary of Terms used in the vacuum coating and surface engineering industries. History and detailed descriptions of Vacuum Deposition Technologies Review of Enabling Technologies and their importance to current applications Extensively referenced text Patents are referenced as part of the history Historical Timelines for Vacuum Coating Technology and Vacuum/Plasma Technology Glossary of Terms for vacuum coating

The Foundations of Vacuum Coating Technology

The Foundations of Vacuum Coating Technology
Author: Donald M. Mattox
Publsiher: Springer Science & Business Media
Total Pages: 150
Release: 2004-04-26
ISBN 10: 9783540204107
ISBN 13: 3540204105
Language: EN, FR, DE, ES & NL

The Foundations of Vacuum Coating Technology Book Review:

The Foundations of Vacuum Coating Technology is a concise review of the developments that have led to the wide variety of applications of this technology. This book is a must for materials scientists and engineers working with vacuum coating in the invention of new technologies or applications in all industries. With over 370 references, this is an excellent starting point for those who don’t want to reinvent the wheel. In particular, the book is a valuable reference for those interested in researching proposed or existing patents. This unique book provides a starting point for more in-depth surveys of past and recent work in all aspects of vacuum coating. The author uses his extensive knowledge of the subject to draw comparisons and place the information into the proper context. This is particularly important for the patent literature where the terminology does not always match industry jargon. A section of acronyms for vacuum coating and glossary of terms at the end of the book are critical additions to the information every reader needs.

Springer Handbook of Electronic and Photonic Materials

Springer Handbook of Electronic and Photonic Materials
Author: Safa Kasap,Peter Capper
Publsiher: Springer
Total Pages: 1536
Release: 2017-10-04
ISBN 10: 331948933X
ISBN 13: 9783319489339
Language: EN, FR, DE, ES & NL

Springer Handbook of Electronic and Photonic Materials Book Review:

The second, updated edition of this essential reference book provides a wealth of detail on a wide range of electronic and photonic materials, starting from fundamentals and building up to advanced topics and applications. Its extensive coverage, with clear illustrations and applications, carefully selected chapter sequencing and logical flow, makes it very different from other electronic materials handbooks. It has been written by professionals in the field and instructors who teach the subject at a university or in corporate laboratories. The Springer Handbook of Electronic and Photonic Materials, second edition, includes practical applications used as examples, details of experimental techniques, useful tables that summarize equations, and, most importantly, properties of various materials, as well as an extensive glossary. Along with significant updates to the content and the references, the second edition includes a number of new chapters such as those covering novel materials and selected applications. This handbook is a valuable resource for graduate students, researchers and practicing professionals working in the area of electronic, optoelectronic and photonic materials.

Very Large Scale Integration

Very Large Scale Integration
Author: Kim Ho Yeap,Humaira Nisar
Publsiher: BoD – Books on Demand
Total Pages: 160
Release: 2018-02-28
ISBN 10: 9535138634
ISBN 13: 9789535138631
Language: EN, FR, DE, ES & NL

Very Large Scale Integration Book Review:

In this book, a variety of topics related to Very-Large-Scale Integration (VLSI) is extensively discussed. The topics encompass the physics of VLSI transistors, the process of integrated chip design and fabrication and the applications of VLSI devices. It is intended to provide information on the latest advancement of VLSI technology to researchers, physicists as well as engineers working in the field of semiconductor manufacturing and VLSI design.

Handbook of Thin Film Deposition Techniques Principles Methods Equipment and Applications Second Editon

Handbook of Thin Film Deposition Techniques Principles  Methods  Equipment and Applications  Second Editon
Author: Krishna Seshan
Publsiher: CRC Press
Total Pages: 72
Release: 2002-02-01
ISBN 10: 9780815514428
ISBN 13: 0815514425
Language: EN, FR, DE, ES & NL

Handbook of Thin Film Deposition Techniques Principles Methods Equipment and Applications Second Editon Book Review:

The Handbook of Thin Film Deposition Techniques: Principles, Methods, Equipment and Applications, Second Edition explores the technology behind the spectacular growth in the silicon semiconductor industry and the continued trend in miniaturization over the last 20 years. This growth has been fueled in large part by improved thin film deposition techniques and the development of highly specialized equipment to enable this deposition. This second edition explains the growth of sophisticated, automatic tools capable of measuring thickness and spacing of submicron dimensions. The book covers PVD, laser and E-beam assisted deposition, MBE, and ion beam methods to bring together all of the physical vapor deposition techniques. The book also includes coverage of chemical mechanical polishing that helps attain the flatness that is required by modern lithography methods and new materials used for interconnect dielectric materials, specifically organic polyimide materials.

Materials Science of Thin Films

Materials Science of Thin Films
Author: Milton Ohring
Publsiher: Academic Press
Total Pages: 794
Release: 2002
ISBN 10: 0125249756
ISBN 13: 9780125249751
Language: EN, FR, DE, ES & NL

Materials Science of Thin Films Book Review:

This is the first book that can be considered a textbook on thin film science, complete with exercises at the end of each chapter. Ohring has contributed many highly regarded reference books to the AP list, including Reliability and Failure of Electronic Materials and the Engineering Science of Thin Films. The knowledge base is intended for science and engineering students in advanced undergraduate or first-year graduate level courses on thin films and scientists and engineers who are entering or require an overview of the field. Since 1992, when the book was first published, the field of thin films has expanded tremendously, especially with regard to technological applications. The second edition will bring the book up-to-date with regard to these advances. Most chapters have been greatly updated, and several new chapters have been added.

The Formation Characterization and Application of Sputtered Al203 and Gamma Fe202 Thin Films

The Formation  Characterization  and Application of Sputtered Al203 and Gamma Fe202 Thin Films
Author: Ga-Lane Chen
Publsiher: Unknown
Total Pages: 329
Release: 1985
ISBN 10:
ISBN 13: MINN:31951001269959D
Language: EN, FR, DE, ES & NL

The Formation Characterization and Application of Sputtered Al203 and Gamma Fe202 Thin Films Book Review:

Thin Film Processes

Thin Film Processes
Author: Jagannathan Thirumalai
Publsiher: BoD – Books on Demand
Total Pages: 220
Release: 2017-04-12
ISBN 10: 9535130676
ISBN 13: 9789535130673
Language: EN, FR, DE, ES & NL

Thin Film Processes Book Review:

The book Thin Film Processes - Artifacts on Surface Phenomena and Technological Facets presents topics on global advancements in theoretical and experimental facts, instrumentation and practical applications of thin-film material perspectives and its applications. The aspect of this book is associated with the thin-film physics, the methods of deposition, optimization parameters and its wide technological applications. This book is divided into three main sections: Thin Film Deposition Methods: A Synthesis Perspective; Optimization Parameters in the Thin Film Science and Application of Thin Films: A Synergistic Outlook. Collected chapters provide applicable knowledge for a wide range of readers: common men, students and researchers. It was constructed by experts in diverse fields of thin-film science and technology from over 15 research institutes across the globe.

Thin Film Materials

Thin Film Materials
Author: L. B. Freund,S. Suresh
Publsiher: Cambridge University Press
Total Pages: 750
Release: 2004-01-08
ISBN 10: 9781139449823
ISBN 13: 1139449826
Language: EN, FR, DE, ES & NL

Thin Film Materials Book Review:

Thin film mechanical behavior and stress presents a technological challenge for materials scientists, physicists and engineers. This book provides a comprehensive coverage of the major issues and topics dealing with stress, defect formation, surface evolution and allied effects in thin film materials. Physical phenomena are examined from the continuum down to the sub-microscopic length scales, with the connections between the structure of the material and its behavior described. Theoretical concepts are underpinned by discussions on experimental methodology and observations. Fundamental scientific concepts are embedded through sample calculations, a broad range of case studies with practical applications, thorough referencing, and end of chapter problems. With solutions to problems available on-line, this book will be essential for graduate courses on thin films and the classic reference for researchers in the field.

Thin Film Device Applications

Thin Film Device Applications
Author: Kasturi Chopra
Publsiher: Springer Science & Business Media
Total Pages: 300
Release: 2012-12-06
ISBN 10: 1461336821
ISBN 13: 9781461336822
Language: EN, FR, DE, ES & NL

Thin Film Device Applications Book Review:

Two-dimensional materials created ab initio by the process of condensation of atoms, molecules, or ions, called thin films, have unique properties significantly different from the corresponding bulk materials as a result of their physical dimensions, geometry, nonequilibrium microstructure, and metallurgy. Further, these characteristic features of thin films can be drasti cally modified and tailored to obtain the desired and required physical characteristics. These features form the basis of development of a host of extraordinary active and passive thin film device applications in the last two decades. On the one extreme, these applications are in the submicron dimensions in such areas as very large scale integration (VLSI), Josephson junction quantum interference devices, magnetic bubbles, and integrated optics. On the other extreme, large-area thin films are being used as selective coatings for solar thermal conversion, solar cells for photovoltaic conver sion, and protection and passivating layers. Indeed, one would be hard pressed to find many sophisticated modern optical and electronic devices which do not use thin films in one way or the other. With the impetus provided by industrial applications, the science and technology of thin films have undergone revolutionary development and even today continue to be recognized globally as frontier areas of RID work. Major technical developments in any field of science and technology are invariably accompanied by an explosion of published literature in the form of scientific publications, reviews, and books.

Chemical Solution Deposition of Functional Oxide Thin Films

Chemical Solution Deposition of Functional Oxide Thin Films
Author: Theodor Schneller,Rainer Waser,Marija Kosec,David Payne
Publsiher: Springer Science & Business Media
Total Pages: 796
Release: 2014-01-24
ISBN 10: 3211993118
ISBN 13: 9783211993118
Language: EN, FR, DE, ES & NL

Chemical Solution Deposition of Functional Oxide Thin Films Book Review:

This is the first text to cover all aspects of solution processed functional oxide thin-films. Chemical Solution Deposition (CSD) comprises all solution based thin- film deposition techniques, which involve chemical reactions of precursors during the formation of the oxide films, i. e. sol-gel type routes, metallo-organic decomposition routes, hybrid routes, etc. While the development of sol-gel type processes for optical coatings on glass by silicon dioxide and titanium dioxide dates from the mid-20th century, the first CSD derived electronic oxide thin films, such as lead zirconate titanate, were prepared in the 1980’s. Since then CSD has emerged as a highly flexible and cost-effective technique for the fabrication of a very wide variety of functional oxide thin films. Application areas include, for example, integrated dielectric capacitors, ferroelectric random access memories, pyroelectric infrared detectors, piezoelectric micro-electromechanical systems, antireflective coatings, optical filters, conducting-, transparent conducting-, and superconducting layers, luminescent coatings, gas sensors, thin film solid-oxide fuel cells, and photoelectrocatalytic solar cells. In the appendix detailed “cooking recipes” for selected material systems are offered.

Microelectromechanical Systems

Microelectromechanical Systems
Author: National Research Council,Division on Engineering and Physical Sciences,National Materials Advisory Board,Commission on Engineering and Technical Systems,Committee on Advanced Materials and Fabrication Methods for Microelectromechanical Systems
Publsiher: National Academies Press
Total Pages: 76
Release: 1998-01-01
ISBN 10: 0309059801
ISBN 13: 9780309059800
Language: EN, FR, DE, ES & NL

Microelectromechanical Systems Book Review:

Microelectromenchanical systems (MEMS) is a revolutionary field that adapts for new uses a technology already optimized to accomplish a specific set of objectives. The silicon-based integrated circuits process is so highly refined it can produce millions of electrical elements on a single chip and define their critical dimensions to tolerances of 100-billionths of a meter. The MEMS revolution harnesses the integrated circuitry know-how to build working microsystems from micromechanical and microelectronic elements. MEMS is a multidisciplinary field involving challenges and opportunites for electrical, mechanical, chemical, and biomedical engineering as well as physics, biology, and chemistry. As MEMS begin to permeate more and more industrial procedures, society as a whole will be strongly affected because MEMS provide a new design technology that could rival--perhaps surpass--the societal impact of integrated circuits.

Japanese Technical Periodical Index

Japanese Technical Periodical Index
Author: Anonim
Publsiher: Unknown
Total Pages: 329
Release: 1987
ISBN 10:
ISBN 13: STANFORD:36105010856438
Language: EN, FR, DE, ES & NL

Japanese Technical Periodical Index Book Review:

Proceedings of 2005 International Symposium on Electrical Insulating Materials ISEIM 2005

Proceedings of 2005 International Symposium on Electrical Insulating Materials  ISEIM 2005
Author: Anonim
Publsiher: Unknown
Total Pages: 243
Release: 2005
ISBN 10: 9784886860637
ISBN 13: 488686063X
Language: EN, FR, DE, ES & NL

Proceedings of 2005 International Symposium on Electrical Insulating Materials ISEIM 2005 Book Review:

Integration of 2D Materials for Electronics Applications

Integration of 2D Materials for Electronics Applications
Author: Filippo Giannazzo,Samuel Lara Avila,Jens Eriksson,Sushant Sonde
Publsiher: MDPI
Total Pages: 264
Release: 2019-02-13
ISBN 10: 3038976067
ISBN 13: 9783038976066
Language: EN, FR, DE, ES & NL

Integration of 2D Materials for Electronics Applications Book Review:

This book is a printed edition of the Special Issue "Integration of 2D Materials for Electronics Applications" that was published in Crystals

Proceedings International IEEE VLSI Multilevel Interconnection Conference

Proceedings      International IEEE VLSI Multilevel Interconnection Conference
Author: Anonim
Publsiher: Unknown
Total Pages: 329
Release: 1987
ISBN 10:
ISBN 13: UOM:39015013836278
Language: EN, FR, DE, ES & NL

Proceedings International IEEE VLSI Multilevel Interconnection Conference Book Review:

Handbook of Thin Film Materials Ferroelectric and dielectric thin films

Handbook of Thin Film Materials  Ferroelectric and dielectric thin films
Author: Hari Singh Nalwa
Publsiher: Unknown
Total Pages: 634
Release: 2002
ISBN 10: 9780125129114
ISBN 13: 0125129114
Language: EN, FR, DE, ES & NL

Handbook of Thin Film Materials Ferroelectric and dielectric thin films Book Review:

Vol.1: Deposition and processing of thin films; Vol.2: Characterization and spectroscopy of thin films; Vol.3: Ferroelectric and dielectric thin films; Vol.4: Semiconductor and superconductor thin films; Vol.5: Nanomaterials and magnetic thin flims

Flash Lamp Annealing

Flash Lamp Annealing
Author: Lars Rebohle,Slawomir Prucnal,Denise Reichel
Publsiher: Springer
Total Pages: 288
Release: 2019-07-27
ISBN 10: 3030232999
ISBN 13: 9783030232993
Language: EN, FR, DE, ES & NL

Flash Lamp Annealing Book Review:

This book provides a comprehensive survey of the technology of flash lamp annealing (FLA) for thermal processing of semiconductors. It gives a detailed introduction to the FLA technology and its physical background. Advantages, drawbacks and process issues are addressed in detail and allow the reader to properly plan and perform their own thermal processing. Moreover, this books gives a broad overview of the applications of flash lamp annealing, including a comprehensive literature survey. Several case studies of simulated temperature profiles in real material systems give the reader the necessary insight into the underlying physics and simulations. This book is a valuable reference work for both novice and advanced users.