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Zinc Compounds Advances in Research and Application 2013 Edition
Author | : Anonim |
Publsiher | : ScholarlyEditions |
Total Pages | : 906 |
Release | : 2013-06-21 |
ISBN 10 | : 1481693476 |
ISBN 13 | : 9781481693479 |
Language | : EN, FR, DE, ES & NL |
Zinc Compounds—Advances in Research and Application: 2013 Edition is a ScholarlyBrief™ that delivers timely, authoritative, comprehensive, and specialized information about ZZZAdditional Research in a concise format. The editors have built Zinc Compounds—Advances in Research and Application: 2013 Edition on the vast information databases of ScholarlyNews.™ You can expect the information about ZZZAdditional Research in this book to be deeper than what you can access anywhere else, as well as consistently reliable, authoritative, informed, and relevant. The content of Zinc Compounds—Advances in Research and Application: 2013 Edition has been produced by the world’s leading scientists, engineers, analysts, research institutions, and companies. All of the content is from peer-reviewed sources, and all of it is written, assembled, and edited by the editors at ScholarlyEditions™ and available exclusively from us. You now have a source you can cite with authority, confidence, and credibility. More information is available at http://www.ScholarlyEditions.com/.
Photomask and X ray Mask Technology
Author | : Anonim |
Publsiher | : Anonim |
Total Pages | : 329 |
Release | : 1997 |
ISBN 10 | : |
ISBN 13 | : UOM:39015035291858 |
Language | : EN, FR, DE, ES & NL |
Handbook of Photomask Manufacturing Technology
Author | : Syed Rizvi |
Publsiher | : CRC Press |
Total Pages | : 728 |
Release | : 2018-10-03 |
ISBN 10 | : 1420028782 |
ISBN 13 | : 9781420028782 |
Language | : EN, FR, DE, ES & NL |
As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it becomes increasingly important for new technologies to keep apace with these demands. Photomask technology is one of the key areas to achieving this goal. Although brief overviews of photomask technology exist in the literature, the Handbook of Photomask Manufacturing Technology is the first in-depth, comprehensive treatment of existing and emerging photomask technologies available. The Handbook of Photomask Manufacturing Technology features contributions from 40 internationally prominent authors from industry, academia, government, national labs, and consortia. These authors discuss conventional masks and their supporting technologies, as well as next-generation, non-optical technologies such as extreme ultraviolet, electron projection, ion projection, and x-ray lithography. The book begins with an overview of the history of photomask development. It then demonstrates the steps involved in designing, producing, testing, inspecting, and repairing photomasks, following the sequences observed in actual production. The text also includes sections on materials used as well as modeling and simulation. Continued refinements in the photomask-making process have ushered in the sub-wavelength era in nanolithography. This invaluable handbook synthesizes these refinements and provides the tools and possibilities necessary to reach the next generation of microfabrication technologies.
Laser Applications in Microelectronic and Optoelectronic Manufacturing
Author | : Anonim |
Publsiher | : Anonim |
Total Pages | : 329 |
Release | : 1999 |
ISBN 10 | : |
ISBN 13 | : UOM:39015048107398 |
Language | : EN, FR, DE, ES & NL |
NEC Research Development
Author | : Anonim |
Publsiher | : Anonim |
Total Pages | : 329 |
Release | : 1999 |
ISBN 10 | : |
ISBN 13 | : CORNELL:31924083107627 |
Language | : EN, FR, DE, ES & NL |
Japanese Journal of Applied Physics
Author | : Anonim |
Publsiher | : Anonim |
Total Pages | : 329 |
Release | : 2007 |
ISBN 10 | : |
ISBN 13 | : UCSC:32106018630985 |
Language | : EN, FR, DE, ES & NL |
Mercury Cadmium Telluride Imagers
Author | : A.C. Onshage |
Publsiher | : Elsevier |
Total Pages | : 436 |
Release | : 1997-06-18 |
ISBN 10 | : 9780080524016 |
ISBN 13 | : 008052401X |
Language | : EN, FR, DE, ES & NL |
In two parts, this book describes the evolution of mercury cadmium telluride (HgCdTe) imager structures based upon published patents and patent applications. The first part covers monolithic arrays, and the second part describes hybrid arrays. Each part has 5 chapters, with each document placed in chronological order, with the documents with the earliest priority placed first. Focus has been directed at the steps of manufacturing and structures of imagers. There is an index at the end of the book containing the patent number, the name of the applicant and the date of publication of each cited document. This monograph will serve as a useful summary of the patents and patent applications in the field of mercury cadmium telluride imagers.
Annual Symposium on Photomask Technology
Author | : Anonim |
Publsiher | : Anonim |
Total Pages | : 329 |
Release | : 2002 |
ISBN 10 | : |
ISBN 13 | : UOM:39015047885242 |
Language | : EN, FR, DE, ES & NL |
Flat Panel Display Manufacturing
Author | : Jun Souk,Shinji Morozumi,Fang-Chen Luo,Ion Bita |
Publsiher | : John Wiley & Sons |
Total Pages | : 496 |
Release | : 2018-07-23 |
ISBN 10 | : 1119161355 |
ISBN 13 | : 9781119161356 |
Language | : EN, FR, DE, ES & NL |
An extensive introduction to the engineering and manufacture of current and next-generation flat panel displays This book provides a broad overview of the manufacturing of flat panel displays, with a particular emphasis on the display systems at the forefront of the current mobile device revolution. It is structured to cover a broad spectrum of topics within the unifying theme of display systems manufacturing. An important theme of this book is treating displays as systems, which expands the scope beyond the technologies and manufacturing of traditional display panels (LCD and OLED) to also include key components for mobile device applications, such as flexible OLED, thin LCD backlights, as well as the manufacturing of display module assemblies. Flat Panel Display Manufacturing fills an important gap in the current book literature describing the state of the art in display manufacturing for today's displays, and looks to create a reference the development of next generation displays. The editorial team brings a broad and deep perspective on flat panel display manufacturing, with a global view spanning decades of experience at leading institutions in Japan, Korea, Taiwan, and the USA, and including direct pioneering contributions to the development of displays. The book includes a total of 24 chapters contributed by experts at leading manufacturing institutions from the global FPD industry in Korea, Japan, Taiwan, Germany, Israel, and USA. Provides an overview of the evolution of display technologies and manufacturing Treats display products as systems with manifold applications, expanding the scope beyond traditional display panel manufacturing to key components for mobile devices and TV applications Provides a detailed overview of LCD manufacturing, including panel architectures, process flows, and module manufacturing Provides a detailed overview of OLED manufacturing for both mobile and TV applications, including a chapter dedicated to the young field of flexible OLED manufacturing Provides a detailed overview of the key unit processes and corresponding manufacturing equipment, including manufacturing test & repair of TFT array panels as well as display module inspection & repair Introduces key topics in display manufacturing science and engineering, including productivity & quality, factory architectures, and green manufacturing Flat Panel Display Manufacturing will appeal to professionals and engineers in R&D departments for display-related technology development, as well as to graduates and Ph.D. students specializing in LCD/OLED/other flat panel displays.
Optical Spectra
Author | : Anonim |
Publsiher | : Anonim |
Total Pages | : 329 |
Release | : 1981 |
ISBN 10 | : |
ISBN 13 | : UOM:39015019245730 |
Language | : EN, FR, DE, ES & NL |
Processing and Applications of Nanowire Electronics
Author | : Nipun Misra |
Publsiher | : Anonim |
Total Pages | : 312 |
Release | : 2009 |
ISBN 10 | : |
ISBN 13 | : UCAL:C3519043 |
Language | : EN, FR, DE, ES & NL |
Laser Focus World
Author | : Anonim |
Publsiher | : Anonim |
Total Pages | : 329 |
Release | : 2009 |
ISBN 10 | : |
ISBN 13 | : UCSD:31822036930014 |
Language | : EN, FR, DE, ES & NL |
Global electro-optic technology and markets.
Photonics Spectra
Author | : Anonim |
Publsiher | : Anonim |
Total Pages | : 329 |
Release | : |
ISBN 10 | : |
ISBN 13 | : UCSD:31822017901620 |
Language | : EN, FR, DE, ES & NL |
Journal of Current Laser Abstracts
Author | : Anonim |
Publsiher | : Anonim |
Total Pages | : 329 |
Release | : 1982 |
ISBN 10 | : |
ISBN 13 | : UOM:39015013045268 |
Language | : EN, FR, DE, ES & NL |
Laser Radiation Photophysics
Author | : Bodil Braren,Michail N. Libenson |
Publsiher | : Anonim |
Total Pages | : 230 |
Release | : 1993 |
ISBN 10 | : |
ISBN 13 | : UOM:39015029998047 |
Language | : EN, FR, DE, ES & NL |
Lasers Optronics
Author | : Anonim |
Publsiher | : Anonim |
Total Pages | : 329 |
Release | : 1990 |
ISBN 10 | : |
ISBN 13 | : UIUC:30112008103548 |
Language | : EN, FR, DE, ES & NL |
2nd International Conference on the Applications of Diamond Films and Related Materials
Author | : Anonim |
Publsiher | : Anonim |
Total Pages | : 857 |
Release | : 1993 |
ISBN 10 | : |
ISBN 13 | : PSU:000026258782 |
Language | : EN, FR, DE, ES & NL |
Applications of High Power Lasers
Author | : Ralph R. Jacobs |
Publsiher | : Society of Photo Optical |
Total Pages | : 96 |
Release | : 1985 |
ISBN 10 | : |
ISBN 13 | : UOM:39015009811228 |
Language | : EN, FR, DE, ES & NL |
Lasers in Industry
Author | : S. S. Charschan |
Publsiher | : Anonim |
Total Pages | : 641 |
Release | : 1972 |
ISBN 10 | : |
ISBN 13 | : UOM:39015000470396 |
Language | : EN, FR, DE, ES & NL |