Developments in Surface Contamination and Cleaning

Developments in Surface Contamination and Cleaning
Author: Rajiv Kohli
Publsiher: William Andrew
Total Pages: 240
Release: 2012-11-05
ISBN 10: 143777881X
ISBN 13: 9781437778816
Language: EN, FR, DE, ES & NL

Developments in Surface Contamination and Cleaning Book Review:

In this series Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. The expert contributions in this volume cover important fundamental aspects of surface contamination that are key to understanding the behavior of specific types of contaminants. This understanding is essential to develop preventative and mitigation methods for contamination control. The coverage complements the treatment of surface contamination in vol.1, Fundamental and Applied Aspects. This volume covers: Sources and Generation of Particles; Manipulation Techniques for Particles on Surfaces; Particle Deposition and Rebound; Particle Behavior in Liquid Systems; Biological and Metallic Contamination; and includes a comprehensive list of current standards and resources. Feature: Comprehensive coverage of innovations in surface contamination and cleaning Benefit: One-stop series where a wide range of readers will be sure to find a solution to their cleaning problem, saving the time involved in consulting a range of disparate sources. Feature: Written by established experts in the contamination and cleaning field Benefit: Provides an authoritative resource Feature: Each chapter is a comprehensive review of the state of the art. Benefit: Can be relied on to provide insight, clarity and real expertise on up-to-the-minute innovations. Feature: Case studies included Benefit: Case studies help the reader see theory applied to the solution of real-world practical cleaning and contamination problems.

Developments in Surface Contamination and Cleaning Applications of Cleaning Techniques

Developments in Surface Contamination and Cleaning  Applications of Cleaning Techniques
Author: Rajiv Kohli,K.L. Mittal
Publsiher: Elsevier
Total Pages: 830
Release: 2018-11-27
ISBN 10: 0128155787
ISBN 13: 9780128155783
Language: EN, FR, DE, ES & NL

Developments in Surface Contamination and Cleaning Applications of Cleaning Techniques Book Review:

Developments in Surface Contamination and Cleaning: Applications of Cleaning Techniques, Volume Eleven, part of the Developments in Surface Contamination and Cleaning series, provides a guide to recent advances in the application of cleaning techniques for the removal of surface contamination in various industries, such as aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. The material in this new edition compiles cleaning applications into one easy reference that has been fully updated to incorporate new applications and techniques. Taken as a whole, the series forms a unique reference for professionals and academics working in the area of surface contamination and cleaning. Presents the latest reviewed technical information on precision cleaning applications as written by established experts in the field Provides a single source on the applications of innovative precision cleaning techniques for a wide variety of industries Serves as a guide to the selection of precision cleaning techniques for specific applications

Developments in Surface Contamination and Cleaning Volume 12

Developments in Surface Contamination and Cleaning  Volume 12
Author: Rajiv Kohli,K.L. Mittal
Publsiher: Elsevier
Total Pages: 276
Release: 2019-06-08
ISBN 10: 0128162953
ISBN 13: 9780128162958
Language: EN, FR, DE, ES & NL

Developments in Surface Contamination and Cleaning Volume 12 Book Review:

Developments in Surface Contamination and Cleaning: Methods for Assessment and Verification of Cleanliness of Surfaces and Characterization of Surface Contaminants, Volume Twelve, the latest release in the Developments in Surface Contamination and Cleaning series, provides best practices on determining surface cleanliness. Chapters include an introduction to the nature and size of particles, a discussion of cleanliness levels, detailed coverage of measurement methods, characterization methods and analytical methods for evaluating surfaces, and an overview of analysis methods for various contaminants. As a whole, the series creates a unique and comprehensive knowledge base for those in research and development in a variety of industries. Manufacturing, quality control and procurement specification professionals in the aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography industries will find this book to be very helpful. In addition, researchers in an academic setting will also find these volumes excellent source books. Includes an extensive listing, with a description of available methods for the assessment of surface cleanliness Provides a single source of information on methods for verification of surface cleanliness Serves as a guide to the selection, assessment and verification of methods for specific applications

Developments in Surface Contamination and Cleaning Vol 1

Developments in Surface Contamination and Cleaning  Vol  1
Author: Rajiv Kohli,Kashmiri L. Mittal
Publsiher: William Andrew
Total Pages: 894
Release: 2015-11-12
ISBN 10: 0323312705
ISBN 13: 9780323312707
Language: EN, FR, DE, ES & NL

Developments in Surface Contamination and Cleaning Vol 1 Book Review:

Developments in Surface Contamination and Cleaning, Vol. 1: Fundamentals and Applied Aspects, Second Edition, provides an excellent source of information on alternative cleaning techniques and methods for characterization of surface contamination and validation. Each volume in this series contains a particular topical focus, covering the key techniques and recent developments in the area. This volume forms the heart of the series, covering the fundamentals and application aspects, characterization of surface contaminants, and methods for removal of surface contamination. In addition, new cleaning techniques effective at smaller scales are considered and employed for removal where conventional cleaning techniques fail, along with new cleaning techniques for molecular contaminants. The Volume is edited by the leading experts in small particle surface contamination and cleaning, providing an invaluable reference for researchers and engineers in R&D, manufacturing, quality control, and procurement specification in a multitude of industries such as aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. Provides best-practice guidance for scientists and engineers engaged in surface cleaning or those who handle the consequences of surface contamination Addresses the continuing trends of shrinking device size and contamination vulnerability in a range of industries as spearheaded by the semiconductor industry Presents state-of-the-art survey information on precision cleaning and characterization methods as written by a team of world-class experts in the field

Developments in Surface Contamination and Cleaning Volume 7

Developments in Surface Contamination and Cleaning  Volume 7
Author: Rajiv Kohli,Kashmiri L. Mittal
Publsiher: William Andrew
Total Pages: 206
Release: 2014-11-18
ISBN 10: 0323311458
ISBN 13: 9780323311458
Language: EN, FR, DE, ES & NL

Developments in Surface Contamination and Cleaning Volume 7 Book Review:

As device sizes in the semiconductor industries are shrinking, they become more vulnerable to smaller contaminant particles, and most conventional cleaning techniques employed in the industry are not as effective at smaller scales. The book series Developments in Surface Contamination and Cleaning as a whole provides an excellent source of information on these alternative cleaning techniques as well as methods for characterization and validation of surface contamination. Each volume has a particular topical focus, covering the key techniques and recent developments in the area. The chapters in this Volume address the sources of surface contaminants and various methods for their collection and characterization, as well as methods for cleanliness validation. Regulatory aspects of cleaning are also covered. The collection of topics in this book is unique and complements other volumes in this series. Edited by the leading experts in small-scale particle surface contamination, cleaning and cleaning control, these books will be an invaluable reference for researchers and engineers in R&D, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. Provides a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination Addresses the continuing trends of shrinking device size and contamination vulnerability in a range of industries, spearheaded by the semiconductor industry and others Includes new regulatory aspects

Handbook for cleaning decontamination of surfaces

Handbook for cleaning decontamination of surfaces
Author: Ingegard Johansson,P. Somasundaran
Publsiher: Elsevier
Total Pages: 992
Release: 2007-06-20
ISBN 10: 9780080555539
ISBN 13: 0080555535
Language: EN, FR, DE, ES & NL

Handbook for cleaning decontamination of surfaces Book Review:

The focus of Handbook for Cleaning/Decontamination of Surfaces lies on cleaning and decontamination of surfaces and solid matter, hard as well as soft. Bringing together in a 2-volume reference source: - current knowledge of the physico-chemical fundamentals underlying the cleaning process; - the different needs for cleaning and how these needs are met by various types of cleaning processes and cleaning agents, including novel approaches; - how to test that cleaning has taken place and to what extent; - the effects of cleaning on the environment; - future trends in cleaning and decontamination, for example the idea of changing surfaces, to hinder the absorbance of dirt and thus make cleaning easier. A brief introduction is given to the legal demands concerning the environment and a historical background, in terms of development of detergents, from soaps to the modern sophisticated formulations. Bactericides, their use and the environmental demands on them are covered. Thorough discussions of mechanisms for cleaning are given in several chapters, both general basic concepts and special cases like particle cleaning and cleaning using microemulsion concepts. * General understanding of how cleaning works, function of ingredients and formulations * Overview of environmental issues and demands from the society in the area * Gives basic formulas for cleaning preparations in most areas

Developments in Surface Contamination and Cleaning Vol 8

Developments in Surface Contamination and Cleaning   Vol 8
Author: Rajiv Kohli,Kashmiri L. Mittal
Publsiher: Mosby Limited
Total Pages: 234
Release: 2017-10-30
ISBN 10: 9780128103388
ISBN 13: 0128103388
Language: EN, FR, DE, ES & NL

Developments in Surface Contamination and Cleaning Vol 8 Book Review:

As device sizes in the semiconductor industries shrink, devices become more vulnerable to smaller contaminant particles, and most conventional cleaning techniques employed in the industry are not effective at smaller scales. The book series Developments in Surface Contamination and Cleaning as a whole provides an excellent source of information on these alternative cleaning techniques as well as methods for characterization and validation of surface contamination. Each volume has a particular topical focus, covering the key techniques and recent developments in the area. Several novel wet and dry surface cleaning methods are addressed in this Volume. Many of these methods have not been reviewed previously, or the previous reviews are dated. These methods are finding increasing commercial application and the information in this book will be of high value to the reader. Edited by the leading experts in small-scale particle surface contamination, cleaning and cleaning control these books will be an invaluable reference for researchers and engineers in R&D, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. Provides a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination Addresses the continuing trends of shrinking device size and contamination vulnerability in a range of industries, spearheaded by the semiconductor industry and others Covers novel wet and dry surface cleaning methods of increasing commercial importance

Surfactants in Precision Cleaning

Surfactants in Precision Cleaning
Author: Rajiv Kohli,Kashmiri L. Mittal
Publsiher: Elsevier
Total Pages: 334
Release: 2021-10-29
ISBN 10: 0128222166
ISBN 13: 9780128222164
Language: EN, FR, DE, ES & NL

Surfactants in Precision Cleaning Book Review:

Surfactants in Precision Cleaning: Removal of Contaminants at the Micro and Nanoscale is a single source of information on surfactants, emulsions, microemulsions and detergents for removal of surface contaminants at the micro and nanoscale. The topics covered include cleaning mechanisms, effect of surfactants, types of stable dispersions (emulsions, microemulsions, surfactants, detergents, etc.), cleaning technology, and cleaning applications. Users will find this volume an excellent resource on the use of stable dispersions in precision cleaning. Single source of current information on surfactants, emulsions, microemulsions and detergents for precision cleaning applications Includes a list of extensive reference sources Discusses specific selection and properties of surfactants and their use in cleaning Provides a guide for cleaning applications in different industry sectors

Handbook of Hygiene Control in the Food Industry

Handbook of Hygiene Control in the Food Industry
Author: H. L. M. Lelieveld,John Holah,M A Mostert
Publsiher: Elsevier
Total Pages: 744
Release: 2005-10-30
ISBN 10: 1845690532
ISBN 13: 9781845690533
Language: EN, FR, DE, ES & NL

Handbook of Hygiene Control in the Food Industry Book Review:

Developments such as the demand for minimally-processed foods have placed a renewed emphasis on good hygienic practices in the food industry. As a result there has been a wealth of new research in this area. Complementing Woodhead’s best-selling Hygiene in the food industry, which reviews current best practice in hygienic design and operation, Handbook of hygiene control in the food industry provides a comprehensive summary of the key trends and issues in food hygiene research. Developments go fast: results of the R&D meanwhile have been applied or are being implemented as this book goes to print. Part one reviews research on the range of contamination risks faced by food processors. Building on this foundation, Part two discusses current trends in the design both of buildings and types of food processing equipment, from heating and packaging equipment to valves, pipes and sensors. Key issues in effective hygiene management are then covered in part three, from risk analysis, good manufacturing practice and standard operating procedures (SOPs) to improving cleaning and decontamination techniques. The final part of the book reviews developments in ways of monitoring the effectiveness of hygiene operations, from testing surface cleanability to sampling techniques and hygiene auditing. Like Hygiene in the food industry, this book is a standard reference for the food industry in ensuring the highest standards of hygiene in food production. Standard reference on high hygiene standards for the food industry Provides a comprehensive summary of the key trends in food hygiene research Effective hygiene management strategies are explored

Developments in Surface Contamination and Cleaning Methods for Surface Cleaning

Developments in Surface Contamination and Cleaning  Methods for Surface Cleaning
Author: Rajiv Kohli,Kashmiri L. Mittal
Publsiher: William Andrew
Total Pages: 212
Release: 2016-11-04
ISBN 10: 0323431720
ISBN 13: 9780323431729
Language: EN, FR, DE, ES & NL

Developments in Surface Contamination and Cleaning Methods for Surface Cleaning Book Review:

Developments in Surface Contamination and Cleaning: Methods for Surface Cleaning, Volume 9, part of the Developments in Surface Contamination and Cleaning series provide a state-of-the-art guide to the current knowledge on the behavior of film-type and particulate surface contaminants and their associated cleaning methods. This newest volume in the series discusses methods of surface cleaning of contaminants and the resources that are needed to deal with them. Taken as a whole, the series forms a unique reference for professionals and academics working in the area of surface contamination and cleaning. A strong theme running through the series is that of surface contamination and cleaning at the micro and nano scales. Provides a comprehensive coverage of innovations in surface cleaning Written by established experts in the surface cleaning field, presenting an authoritative resource Contains a comprehensive review of the state-of-the-art, including case studies to enhance the learning process

Handbook for Critical Cleaning Second Edition 2 Volume Set

Handbook for Critical Cleaning  Second Edition   2 Volume Set
Author: Barbara Kanegsberg,Edward Kanegsberg
Publsiher: CRC Press
Total Pages: 1136
Release: 2020-01-02
ISBN 10: 1466515945
ISBN 13: 9781466515949
Language: EN, FR, DE, ES & NL

Handbook for Critical Cleaning Second Edition 2 Volume Set Book Review:

NOTE: This set consists of two volumes: Cleaning Agents and Systems and Applications, Processes, and Controls. Updated, expanded, re-organized, and rewritten, this two-volume handbook covers cleaning processes, applications, management, safety, and environmental concerns. The editors rigorously examine technical issues, cleaning agent options and systems, chemical and equipment integration, and contamination control, as well as cleanliness standards, analytical testing, process selection, implementation and maintenance, specific application areas, and regulatory issues. A collection of international contributors gives the text a global viewpoint. Color illustrations, video clips, and animation are available online to help readers better understand presented material.

Self Cleaning of Surfaces and Water Droplet Mobility

Self Cleaning of Surfaces and Water Droplet Mobility
Author: Bekir Sami Yilbas,Abdullah Al-Sharafi,Haider Ali
Publsiher: Elsevier
Total Pages: 454
Release: 2019-04-25
ISBN 10: 0128147776
ISBN 13: 9780128147771
Language: EN, FR, DE, ES & NL

Self Cleaning of Surfaces and Water Droplet Mobility Book Review:

Self-Cleaning of Surfaces and Water Droplet Mobility deals with the self-cleaning of hydrophobic surfaces. Chapters cover the basics of wetting states of fluids and surface characteristics in terms of texture topology and free energy. The self-cleaning aspects of surfaces, such as various synthesizing and fabrication processes are then introduced and discussed, along with environmental dust properties, including elemental compositions, particle sizes and shapes, and their chemo-mechanics characteristics. In addition, mud formation in humid air, as well as ambient and dry mud adhesion on optically transparent surfaces is explored, as is water droplet dynamics on hydrophilic and hydrophobic surfaces, amongst other topics. The book fills the gap between the physical fundamentals of surface energy and texture characteristics for practical applications of surface cleaning and provides a basic understanding of the self-cleaning of surfaces that will be idea for academics, researchers and students. Showcases the fundamental aspects of the self-cleaning of surfaces Includes practical applications in energy and other sectors Contains a review of the characterization of environmental dust on hydrophilic and hydrophobic surfaces Discusses the fabrication and optimization of surfaces towards self-cleaning Presents practical applications of the self-cleaning of surfaces via water droplet mobility

Developments in Surface Contamination and Cleaning Volume 3

Developments in Surface Contamination and Cleaning  Volume 3
Author: Rajiv Kohli,Kashmiri L. Mittal
Publsiher: William Andrew
Total Pages: 258
Release: 2011-03-25
ISBN 10: 9781437778861
ISBN 13: 1437778860
Language: EN, FR, DE, ES & NL

Developments in Surface Contamination and Cleaning Volume 3 Book Review:

The contributions in this volume cover methods for removal of particle contaminants on surfaces. Several of these methods are well established and have been employed in industrial applications for a long time. However, the ever- higher demand for removal of smaller particles on newer substrate materials is driving continuous development of the established cleaning methods and alternative innovative methods for particle removal. This book provides information on the latest developments in this topic area. Comprehensive coverage of innovations in surface contamination and cleaning Written by established experts in the contamination and cleaning field Each chapter is a comprehensive review of the state of the art Case studies included

Developments in Surface Contamination and Cleaning Vol 6

Developments in Surface Contamination and Cleaning   Vol 6
Author: Rajiv Kohli,Kashmiri L. Mittal
Publsiher: William Andrew
Total Pages: 208
Release: 2013-05-27
ISBN 10: 1437778801
ISBN 13: 9781437778809
Language: EN, FR, DE, ES & NL

Developments in Surface Contamination and Cleaning Vol 6 Book Review:

In this series Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. The expert contributions in this volume cover important fundamental aspects of surface contamination that are key to understanding the behavior of specific types of contaminants. This understanding is essential to develop preventative and mitigation methods for contamination control. The coverage complements the treatment of surface contamination in vol.1, Fundamental and Applied Aspects. This volume covers: Sources and Generation of Particles; Manipulation Techniques for Particles on Surfaces; Particle Deposition and Rebound; Particle Behavior in Liquid Systems; Biological and Metallic Contamination; and includes a comprehensive list of current standards and resources. Comprehensive coverage of innovations in surface contamination and cleaning Written by established experts in the contamination and cleaning field Each chapter is a comprehensive review of the state of the art Case studies included

Photovoltaic Manufacturing

Photovoltaic Manufacturing
Author: Monika Freunek Muller
Publsiher: John Wiley & Sons
Total Pages: 208
Release: 2021-08-16
ISBN 10: 1119242010
ISBN 13: 9781119242017
Language: EN, FR, DE, ES & NL

Photovoltaic Manufacturing Book Review:

This is the first book on photovoltaic wet processing for silicon wafers, both mono- and multi-crystalline. The comprehensive book provides information to process, equipment, and device engineers and researchers in the solar manufacturing field. The authors of the chapters are world-class researchers and experts in their field of endeavor. The fundamentals of wet processing chemistry are introduced, covering etching, texturing, cleaning and metrology. New developments, innovative approaches, as well as current challenges are presented. A detailed discussion of black silicon is provided.

Developments in Surface Contamination and Cleaning Vol 2

Developments in Surface Contamination and Cleaning   Vol 2
Author: Rajiv Kohli,Kashmiri L. Mittal
Publsiher: William Andrew
Total Pages: 312
Release: 2009-10-02
ISBN 10: 9781437778311
ISBN 13: 1437778313
Language: EN, FR, DE, ES & NL

Developments in Surface Contamination and Cleaning Vol 2 Book Review:

Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. Topics covered include: A systems analysis approach to contamination control Physical factors that influence the behavior of particle deposition in enclosures An overview of current yield models and description of advanced models Types of strippable coatings, their properties and applications of these coatings for removal of surface contaminants In-depth coverage of ultrasonic cleaning Contamination and cleaning issues at the nanoscale Experimental results illustrating the impact of model parameters on the removal of particle contamination The expert contributions in this book provide a valuable source of information on the current status and recent developments in surface contamination and cleaning. The book will be of value to industry, government and academic personnel involved in research and development, manufacturing, process and quality control, and procurement specifications across sectors including microelectronics, aerospace, optics, xerography and joining (adhesive bonding). ABOUT THE EDITORS Rajiv Kohli is a leading expert with The Aerospace Corporation in contaminant particle behavior, surface cleaning, and contamination control. At the NASA Johnson Space Center in Houston, Texas, he provides technical support for contamination control related to ground-based and manned spaceflight hardware for the Space Shuttle, the International Space Station, and the new Constellation Program that is designed to meet the United States Vision for Space Exploration. Kashmiri Lal "Kash" Mittal was associated with IBM from 1972 to 1994. Currently, he is teaching and consulting in the areas of surface contamination and cleaning, and in adhesion science and technology. He is the Editor-in-Chief of the Journal of Adhesion Science and Technology and is the editor of 98 published books, many of them dealing with surface contamination and cleaning. Also available Developments in Surface Contamination and Cleaning, Volume 1: Fundamentals and Applied Aspects (edited by Rajiv Kohli & K.L. Mittal). ISBN: 9780815515555. · Provides guidance on best-practice cleaning techniques and the avoidance of surface contamination · Covers contamination and cleaning issues at the nanoscale · Includes an in-depth look at ultrasonic cleaning

Advancing Silicon Carbide Electronics Technology I

Advancing Silicon Carbide Electronics Technology I
Author: Konstantinos Zekentes,Konstantin Vasilevskiy
Publsiher: Materials Research Forum LLC
Total Pages: 250
Release: 2018-09-20
ISBN 10: 1945291850
ISBN 13: 9781945291852
Language: EN, FR, DE, ES & NL

Advancing Silicon Carbide Electronics Technology I Book Review:

The rapidly advancing Silicon Carbide technology has a great potential in high temperature and high frequency electronics. High thermal stability and outstanding chemical inertness make SiC an excellent material for high-power, low-loss semiconductor devices. The present volume presents the state of the art of SiC device fabrication and characterization. Topics covered include: SiC surface cleaning and etching techniques; electrical characterization methods and processing of ohmic contacts to silicon carbide; analysis of contact resistivity dependence on material properties; limitations and accuracy of contact resistivity measurements; ohmic contact fabrication and test structure design; overview of different metallization schemes and processing technologies; thermal stability of ohmic contacts to SiC, their protection and compatibility with device processing; Schottky contacts to SiC; Schottky barrier formation; Schottky barrier inhomogeneity in SiC materials; technology and design of 4H-SiC Schottky and Junction Barrier Schottky diodes; Si/SiC heterojunction diodes; applications of SiC Schottky diodes in power electronics and temperature/light sensors; high power SiC unipolar and bipolar switching devices; different types of SiC devices including material and technology constraints on device performance; applications in the area of metal contacts to silicon carbide; status and prospects of SiC power devices.

Self Cleaning Materials and Surfaces

Self Cleaning Materials and Surfaces
Author: Walid A. Daoud
Publsiher: John Wiley & Sons
Total Pages: 368
Release: 2013-07-12
ISBN 10: 1118652363
ISBN 13: 9781118652367
Language: EN, FR, DE, ES & NL

Self Cleaning Materials and Surfaces Book Review:

With increasing demand for hygienic, self-disinfecting and contamination free surfaces, interest in developing self-cleaning protective materials and surfaces has grown rapidly in recent times. This new title comprises of invited chapters from renowned researchers in the area of self-cleaning nano-coatings and the result is a comprehensive review of current research on both hydrophobic and hydrophilic (photocatalytic effect) self-cleaning materials.

Surface Contamination

Surface Contamination
Author: K. L. Mittal
Publsiher: Unknown
Total Pages: 556
Release: 1979
ISBN 10: 9781468435078
ISBN 13: 1468435078
Language: EN, FR, DE, ES & NL

Surface Contamination Book Review:

Handbook of Silicon Wafer Cleaning Technology 2nd Edition

Handbook of Silicon Wafer Cleaning Technology  2nd Edition
Author: Karen Reinhardt,Werner Kern
Publsiher: William Andrew
Total Pages: 660
Release: 2008-12-10
ISBN 10: 0815517734
ISBN 13: 9780815517733
Language: EN, FR, DE, ES & NL

Handbook of Silicon Wafer Cleaning Technology 2nd Edition Book Review:

The second Edition of the Handbook of Silicon Wafer Cleaning Technology is intended to provide knowledge of wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits. The integration of the clean processes into the device manufacturing flow will be presented with respect to other manufacturing steps such as thermal, implant, etching, and photolithography processes. The Handbook discusses both wet and plasma-based cleaning technologies that are used for removing contamination, particles, residue, and photoresist from wafer surfaces. Both the process and the equipment are covered. A review of the current cleaning technologies is included. Also, advanced cleaning technologies that are under investigation for next generation processing are covered; including supercritical fluid, laser, and cryoaerosol cleaning techniques. Additionally theoretical aspects of the cleaning technologies and how these processes affect the wafer is discussed such as device damage and surface roughening will be discussed. The analysis of the wafers surface is outlined. A discussion of the new materials and the changes required for the surface conditioning process used for manufacturing is also included. Focused on silicon wafer cleaning techniques including wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits As this book covers the major technologies for removing contaminants, it is a reliable reference for anyone that manufactures integrated circuits, or supplies the semiconductor and microelectronics industries Covers processes and equipment, as well as new materials and changes required for the surface conditioning process Editors are two of the top names in the field and are both extensively published Discusses next generation processing techniques including supercritical fluid, laser, and cryoaerosol