Ferroelectricity in Doped Hafnium Oxide

Ferroelectricity in Doped Hafnium Oxide
Author: Uwe Schroeder,Cheol Seong Hwang,Hiroshi Funakubo
Publsiher: Woodhead Publishing
Total Pages: 570
Release: 2019-03-27
ISBN 10: 0081024312
ISBN 13: 9780081024317
Language: EN, FR, DE, ES & NL

Ferroelectricity in Doped Hafnium Oxide Book Review:

Ferroelectricity in Doped Hafnium Oxide: Materials, Properties and Devices covers all aspects relating to the structural and electrical properties of HfO2 and its implementation into semiconductor devices, including a comparison to standard ferroelectric materials. The ferroelectric and field-induced ferroelectric properties of HfO2-based films are considered promising for various applications, including non-volatile memories, negative capacitance field-effect-transistors, energy storage, harvesting, and solid-state cooling. Fundamentals of ferroelectric and piezoelectric properties, HfO2 processes, and the impact of dopants on ferroelectric properties are also extensively discussed in the book, along with phase transition, switching kinetics, epitaxial growth, thickness scaling, and more. Additional chapters consider the modeling of ferroelectric phase transformation, structural characterization, and the differences and similarities between HFO2 and standard ferroelectric materials. Finally, HfO2 based devices are summarized. Explores all aspects of the structural and electrical properties of HfO2, including processes, modelling and implementation into semiconductor devices Considers potential applications including FeCaps, FeFETs, NCFETs, FTJs and more Provides comparison of an emerging ferroelectric material to conventional ferroelectric materials with insights to the problems of downscaling that conventional ferroelectrics face

Negative Capacitance in Ferroelectric Materials

Negative Capacitance in Ferroelectric Materials
Author: Michael Hoffmann
Publsiher: BoD – Books on Demand
Total Pages: 170
Release: 2020-09-15
ISBN 10: 3751999361
ISBN 13: 9783751999366
Language: EN, FR, DE, ES & NL

Negative Capacitance in Ferroelectric Materials Book Review:

This dissertation investigates the phenomenon of negative capacitance in ferroelectric materials, which is promising for overcoming the fundamental limits of energy efficiency in electronics. The focus of this dissertation is on negative capacitance in hafnium oxide based ferroelectrics and the impact of ferroelectric domain formation.

Ferroelectric Gate Field Effect Transistor Memories

Ferroelectric Gate Field Effect Transistor Memories
Author: Byung-Eun Park,Hiroshi Ishiwara,Masanori Okuyama,Shigeki Sakai,Sung-Min Yoon
Publsiher: Springer Nature
Total Pages: 425
Release: 2020-03-23
ISBN 10: 9811512124
ISBN 13: 9789811512124
Language: EN, FR, DE, ES & NL

Ferroelectric Gate Field Effect Transistor Memories Book Review:

This book provides comprehensive coverage of the materials characteristics, process technologies, and device operations for memory field-effect transistors employing inorganic or organic ferroelectric thin films. This transistor-type ferroelectric memory has interesting fundamental device physics and potentially large industrial impact. Among various applications of ferroelectric thin films, the development of nonvolatile ferroelectric random access memory (FeRAM) has been most actively progressed since the late 1980s and reached modest mass production for specific application since 1995. There are two types of memory cells in ferroelectric nonvolatile memories. One is the capacitor-type FeRAM and the other is the field-effect transistor (FET)-type FeRAM. Although the FET-type FeRAM claims the ultimate scalability and nondestructive readout characteristics, the capacitor-type FeRAMs have been the main interest for the major semiconductor memory companies, because the ferroelectric FET has fatal handicaps of cross-talk for random accessibility and short retention time. This book aims to provide the readers with development history, technical issues, fabrication methodologies, and promising applications of FET-type ferroelectric memory devices, presenting a comprehensive review of past, present, and future technologies. The topics discussed will lead to further advances in large-area electronics implemented on glass, plastic or paper substrates as well as in conventional Si electronics. The book is composed of chapters written by leading researchers in ferroelectric materials and related device technologies, including oxide and organic ferroelectric thin films.

Memristive Devices for Brain Inspired Computing

Memristive Devices for Brain Inspired Computing
Author: Sabina Spiga,Abu Sebastian,Damien Querlioz,Bipin Rajendran
Publsiher: Woodhead Publishing
Total Pages: 564
Release: 2020-06-12
ISBN 10: 0081027877
ISBN 13: 9780081027875
Language: EN, FR, DE, ES & NL

Memristive Devices for Brain Inspired Computing Book Review:

Memristive Devices for Brain-Inspired Computing: From Materials, Devices, and Circuits to Applications—Computational Memory, Deep Learning, and Spiking Neural Networks reviews the latest in material and devices engineering for optimizing memristive devices beyond storage applications and toward brain-inspired computing. The book provides readers with an understanding of four key concepts, including materials and device aspects with a view of current materials systems and their remaining barriers, algorithmic aspects comprising basic concepts of neuroscience as well as various computing concepts, the circuits and architectures implementing those algorithms based on memristive technologies, and target applications, including brain-inspired computing, computational memory, and deep learning. This comprehensive book is suitable for an interdisciplinary audience, including materials scientists, physicists, electrical engineers, and computer scientists. Provides readers an overview of four key concepts in this emerging research topic including materials and device aspects, algorithmic aspects, circuits and architectures and target applications Covers a broad range of applications, including brain-inspired computing, computational memory, deep learning and spiking neural networks Includes perspectives from a wide range of disciplines, including materials science, electrical engineering and computing, providing a unique interdisciplinary look at the field

Electrical Characterisation of Ferroelectric Field Effect Transistors based on Ferroelectric HfO2 Thin Films

Electrical Characterisation of Ferroelectric Field Effect Transistors based on Ferroelectric HfO2 Thin Films
Author: Ekaterina Yurchuk
Publsiher: Logos Verlag Berlin GmbH
Total Pages: 238
Release: 2015-06-30
ISBN 10: 3832540032
ISBN 13: 9783832540036
Language: EN, FR, DE, ES & NL

Electrical Characterisation of Ferroelectric Field Effect Transistors based on Ferroelectric HfO2 Thin Films Book Review:

Ferroelectric field effect transistor (FeFET) memories based on a new type of ferroelectric material (silicon doped hafnium oxide) were studied within the scope of the present work. Utilisation of silicon doped hafnium oxide (Si:HfO2 thin films instead of conventional perovskite ferroelectrics as a functional layer in FeFETs provides compatibility to the CMOS process as well as improved device scalability. The influence of different process parameters on the properties of Si:HfO2 thin films was analysed in order to gain better insight into the occurrence of ferroelectricity in this system. A subsequent examination of the potential of this material as well as its possible limitations with the respect to the application in non-volatile memories followed. The Si:HfO2-based ferroelectric transistors that were fully integrated into the state-of-the-art high-k metal gate CMOS technology were studied in this work for the first time. The memory performance of these devices scaled down to 28 nm gate length was investigated. Special attention was paid to the charge trapping phenomenon shown to significantly affect the device behaviour.

Ferroelectric Films

Ferroelectric Films
Author: A. S. Bhalla,K. Manikantan Nair
Publsiher: Amer Ceramic Society
Total Pages: 469
Release: 1992
ISBN 10:
ISBN 13: UOM:39015029874396
Language: EN, FR, DE, ES & NL

Ferroelectric Films Book Review:

Magnetic Ferroelectric and Multiferroic Metal Oxides

Magnetic  Ferroelectric  and Multiferroic Metal Oxides
Author: Biljana Stojanovic
Publsiher: Elsevier
Total Pages: 658
Release: 2018-01-02
ISBN 10: 012811181X
ISBN 13: 9780128111819
Language: EN, FR, DE, ES & NL

Magnetic Ferroelectric and Multiferroic Metal Oxides Book Review:

Magnetic, Ferroelectric, and Multiferroic Metal Oxides covers the fundamental and theoretical aspects of ferroics and magnetoelectrics, their properties, and important technological applications, serving as the most comprehensive, up-to-date reference on the subject. Organized in four parts, Dr. Biljana Stojanovic leads expert contributors in providing the context to understand the material (Part I: Introduction), the theoretical and practical aspects of ferroelectrics (Part II: Ferroelectrics: From Theory, Structure and Preparation to Application), magnetic metal oxides (Part III: Magnetic Oxides: Ferromagnetics, Antiferromagnetics and Ferrimagnetics), multiferroics (Part IV: Multiferroic Metal Oxides) and future directions in research and application (Part V: Future of Metal Oxide Ferroics and Multiferroics). As ferroelectric materials are used to make capacitors with high dielectric constant, transducers, and actuators, and in sensors, reed heads, and memories based on giant magnetoresistive effects, this book will provide an ideal source for the most updated information. Addresses ferroelectrics, ferromagnetics and multiferroelectrics, providing a one-stop reference for researchers Provides fundamental theory and relevant, important technological applications Highlights their use in capacitors with high dielectric constant, transducers, and actuators, and in sensors, reed heads, and memories based on giant magnetoresistive effects

Ferroelectric Thin Films

Ferroelectric Thin Films
Author: Masanori Okuyama
Publsiher: Springer Science & Business Media
Total Pages: 244
Release: 2005-02-22
ISBN 10: 9783540241638
ISBN 13: 3540241639
Language: EN, FR, DE, ES & NL

Ferroelectric Thin Films Book Review:

Ferroelectric thin films continue to attract much attention due to their developing applications in memory devices, FeRAM, infrared sensors, piezoelectric sensors and actuators. This book, aimed at students, researchers and developers, gives detailed information about the basic properties of these materials and the associated device physics. The contributing authors are acknowledged experts in the field.

The Future of Semiconductor Oxides in Next Generation Solar Cells

The Future of Semiconductor Oxides in Next Generation Solar Cells
Author: Monica Lira-Cantu
Publsiher: Elsevier
Total Pages: 566
Release: 2017-09-19
ISBN 10: 0128109963
ISBN 13: 9780128109960
Language: EN, FR, DE, ES & NL

The Future of Semiconductor Oxides in Next Generation Solar Cells Book Review:

The Future of Semiconductor Oxides in Next-Generation Solar Cells begins with several chapters covering the synthesis of semiconductor oxides for NGSCs. Part II goes on to cover the types and applications of NGSCs currently under development, while Part III brings the two together, covering specific processing techniques for NGSC construction. Finally, Part IV discusses the stability of SO solar cells compared to organic solar cells, and the possibilities offered by hybrid technologies. This comprehensive book is an essential reference for all those academics and professionals who require thorough knowledge of recent and future developments in the role of semiconductor oxides in next generation solar cells. Unlocks the potential of advanced semiconductor oxides to transform Next Generation Solar Cell (NGSC) design Full coverage of new developments and recent research make this essential reading for researchers and engineers alike Explains the synthesis and processing of semiconductor oxides with a view to their use in NGSCs

Advanced Materials

Advanced Materials
Author: Ivan A. Parinov,Shun-Hsyung Chang,Banh Tien Long
Publsiher: Springer Nature
Total Pages: 621
Release: 2020-06-16
ISBN 10: 3030451208
ISBN 13: 9783030451202
Language: EN, FR, DE, ES & NL

Advanced Materials Book Review:

This book presents selected peer-reviewed contributions from the 2019 International Conference on “Physics and Mechanics of New Materials and Their Applications”, PHENMA 2019 (Hanoi, Vietnam, 7–10 November, 2019), divided into four scientific themes: processing techniques, physics, mechanics, and applications of advanced materials. The book describes a broad spectrum of promising nanostructures, crystals, materials and composites with special properties. It presents nanotechnology approaches, modern environmentally friendly techniques and physical-chemical and mechanical studies of the structural-sensitive and physical–mechanical properties of materials. The obtained results are based on new achievements in material sciences and computational approaches, methods and algorithms (in particular, finite-element and finite-difference modeling) applied to the solution of different technological, mechanical and physical problems. The obtained results have a significant interest for theory, modeling and test of advanced materials. Other results are devoted to promising devices demonstrating high accuracy, longevity and new opportunities to work effectively under critical temperatures and high pressures, in aggressive media, etc. These devices demonstrate improved comparative characteristics, caused by developed materials and composites, allowing investigation of physio-mechanical processes and phenomena based on scientific and technological progress.

Micro and Nano Fabrication

Micro and Nano Fabrication
Author: Hans H. Gatzen,Volker Saile,Jürg Leuthold
Publsiher: Springer
Total Pages: 519
Release: 2015-01-02
ISBN 10: 3662443953
ISBN 13: 9783662443958
Language: EN, FR, DE, ES & NL

Micro and Nano Fabrication Book Review:

For Microelectromechanical Systems (MEMS) and Nanoelectromechanical Systems (NEMS) production, each product requires a unique process technology. This book provides a comprehensive insight into the tools necessary for fabricating MEMS/NEMS and the process technologies applied. Besides, it describes enabling technologies which are necessary for a successful production, i.e., wafer planarization and bonding, as well as contamination control.

Electroceramics

Electroceramics
Author: A. J. Moulson,J. M. Herbert
Publsiher: John Wiley & Sons
Total Pages: 576
Release: 2003-09-12
ISBN 10: 0470864974
ISBN 13: 9780470864975
Language: EN, FR, DE, ES & NL

Electroceramics Book Review:

Electroceramics, Materials, Properties, Applications, Second Edition provides a comprehensive treatment of the many aspects of ceramics and their electrical applications. The fundamentals of how electroceramics function are carefully introduced with their properties and applications also considered. Starting from elementary principles, the physical, chemical and mathematical background of the subject are discussed and wherever appropriate, a strong emphasis is placed on the relationship between microstructire and properties. The Second Edition has been fully revised and updated, building on the foundation of the earlier book to provide a concise text for all those working in the growing field of electroceramics. fully revised and updated to include the latest technological changes and developments in the field includes end of chapter problems and an extensive bibliography an Invaluable text for all Materials Science students. a useful reference for physicists, chemists and engineers involved in the area of electroceramics.

Nanometer CMOS ICs

Nanometer CMOS ICs
Author: Harry J.M. Veendrick
Publsiher: Springer
Total Pages: 611
Release: 2017-04-28
ISBN 10: 3319475975
ISBN 13: 9783319475974
Language: EN, FR, DE, ES & NL

Nanometer CMOS ICs Book Review:

This textbook provides a comprehensive, fully-updated introduction to the essentials of nanometer CMOS integrated circuits. It includes aspects of scaling to even beyond 12nm CMOS technologies and designs. It clearly describes the fundamental CMOS operating principles and presents substantial insight into the various aspects of design implementation and application. Coverage includes all associated disciplines of nanometer CMOS ICs, including physics, lithography, technology, design, memories, VLSI, power consumption, variability, reliability and signal integrity, testing, yield, failure analysis, packaging, scaling trends and road blocks. The text is based upon in-house Philips, NXP Semiconductors, Applied Materials, ASML, IMEC, ST-Ericsson, TSMC, etc., courseware, which, to date, has been completed by more than 4500 engineers working in a large variety of related disciplines: architecture, design, test, fabrication process, packaging, failure analysis and software.

Advances in Non volatile Memory and Storage Technology

Advances in Non volatile Memory and Storage Technology
Author: Yoshio Nishi
Publsiher: Elsevier
Total Pages: 532
Release: 2014-06-24
ISBN 10: 0857098098
ISBN 13: 9780857098092
Language: EN, FR, DE, ES & NL

Advances in Non volatile Memory and Storage Technology Book Review:

New solutions are needed for future scaling down of nonvolatile memory. Advances in Non-volatile Memory and Storage Technology provides an overview of developing technologies and explores their strengths and weaknesses. After an overview of the current market, part one introduces improvements in flash technologies, including developments in 3D NAND flash technologies and flash memory for ultra-high density storage devices. Part two looks at the advantages of designing phase change memory and resistive random access memory technologies. It looks in particular at the fabrication, properties, and performance of nanowire phase change memory technologies. Later chapters also consider modeling of both metal oxide and resistive random access memory switching mechanisms, as well as conductive bridge random access memory technologies. Finally, part three looks to the future of alternative technologies. The areas covered include molecular, polymer, and hybrid organic memory devices, and a variety of random access memory devices such as nano-electromechanical, ferroelectric, and spin-transfer-torque magnetoresistive devices. Advances in Non-volatile Memory and Storage Technology is a key resource for postgraduate students and academic researchers in physics, materials science, and electrical engineering. It is a valuable tool for research and development managers concerned with electronics, semiconductors, nanotechnology, solid-state memories, magnetic materials, organic materials, and portable electronic devices. Provides an overview of developing nonvolatile memory and storage technologies and explores their strengths and weaknesses Examines improvements to flash technology, charge trapping, and resistive random access memory Discusses emerging devices such as those based on polymer and molecular electronics, and nanoelectromechanical random access memory (RAM)

The Applications of Ferroelectric Polymers

The Applications of Ferroelectric Polymers
Author: T. T. Wang,J. M. Herbert,Alastair M. Glass
Publsiher: Chapman & Hall
Total Pages: 387
Release: 1988
ISBN 10:
ISBN 13: UCAL:B4164443
Language: EN, FR, DE, ES & NL

The Applications of Ferroelectric Polymers Book Review:

Ferroelectric Materials and Their Applications

Ferroelectric Materials and Their Applications
Author: Y. Xu
Publsiher: Elsevier
Total Pages: 406
Release: 2013-10-22
ISBN 10: 1483290956
ISBN 13: 9781483290959
Language: EN, FR, DE, ES & NL

Ferroelectric Materials and Their Applications Book Review:

This book presents the basic physical properties, structure, fabrication methods and applications of ferroelectric materials. These are widely used in various devices, such as piezoelectric/electrostrictive transducers and actuators, pyroelectric infrared detectors, optical integrated circuits, optical data storage, display devices, etc. The ferroelectric materials described in this book include a relatively complete list of practical and promising ferroelectric single crystals, bulk ceramics and thin films. Included are perovskite-type, lithium niobate, tungsten-bronze-type, water-soluable crystals and other inorganic materials, as well as organic ferroelectrics (polymers, liquid crystals, and composites). Basic concepts, principles and methods for the physical property characteristics of ferroelectric materials are introduced in the first two chapters for those readers new to the subject of ferroelectricity. Not only professional researchers and engineers but also students and other readers who have limited physical knowledge and an interest in ferroelectrics, will welcome this book.

Nanophotonics Nanooptics Nanobiotechnology and Their Applications

Nanophotonics  Nanooptics  Nanobiotechnology  and Their Applications
Author: Olena Fesenko,Leonid Yatsenko
Publsiher: Springer
Total Pages: 473
Release: 2019-07-31
ISBN 10: 3030177556
ISBN 13: 9783030177553
Language: EN, FR, DE, ES & NL

Nanophotonics Nanooptics Nanobiotechnology and Their Applications Book Review:

This book highlights some of the latest advances in nanotechnology and nanomaterials from leading researchers in Ukraine, Europe, and beyond. It features contributions from participants in the 6th International Science and Practice Conference Nanotechnology and Nanomaterials (NANO2018) in Kiev, Ukraine on August 27-30, 2018 organized by the Institute of Physics of the National Academy of Sciences of Ukraine, University of Tartu (Estonia), University of Turin (Italy), and Pierre and Marie Curie University (France). Internationally recognized experts from a wide range of universities and research institutions share their knowledge and key results on nanooptics, energy storage and biomedical applications. This book's companion volume also addresses topics such as materials properties, behavior, and synthesis.

High Permittivity Gate Dielectric Materials

High Permittivity Gate Dielectric Materials
Author: Samares Kar
Publsiher: Springer Science & Business Media
Total Pages: 489
Release: 2013-06-25
ISBN 10: 3642365353
ISBN 13: 9783642365355
Language: EN, FR, DE, ES & NL

High Permittivity Gate Dielectric Materials Book Review:

"The book comprehensively covers all the current and the emerging areas of the physics and the technology of high permittivity gate dielectric materials, including, topics such as MOSFET basics and characteristics, hafnium-based gate dielectric materials, Hf-based gate dielectric processing, metal gate electrodes, flat-band and threshold voltage tuning, channel mobility, high-k gate stack degradation and reliability, lanthanide-based high-k gate stack materials, ternary hafnia and lanthania based high-k gate stack films, crystalline high-k oxides, high mobility substrates, and parameter extraction. Each chapter begins with the basics necessary for understanding the topic, followed by a comprehensive review of the literature, and ultimately graduating to the current status of the technology and our scientific understanding and the future prospects." .

Ferroelectric Random Access Memories

Ferroelectric Random Access Memories
Author: Hiroshi Ishiwara,Masanori Okuyama,Yoshihiro Arimoto
Publsiher: Springer Science & Business Media
Total Pages: 290
Release: 2004-04-16
ISBN 10: 9783540407188
ISBN 13: 3540407189
Language: EN, FR, DE, ES & NL

Ferroelectric Random Access Memories Book Review:

The book consists of 5 parts: (1) ferroelectric thin films, (2) deposition and characterization methods, (3) fabrication process and circuit design, (4) advanced-type memories, and (5) applications and future prospects; each part is further divided into several chapters. Because of the wide range of topics discussed, each chapter in this book was written by one of the best authors knowing the specific topic very well.

Nanotechnology and Photocatalysis for Environmental Applications

Nanotechnology and Photocatalysis for Environmental Applications
Author: Muhammad Bilal Tahir,Muhammad Rafique,Muhammad Shahid Rafique
Publsiher: Elsevier
Total Pages: 244
Release: 2020-07-14
ISBN 10: 0128211970
ISBN 13: 9780128211977
Language: EN, FR, DE, ES & NL

Nanotechnology and Photocatalysis for Environmental Applications Book Review:

Nanotechnology and Photocatalysis for Environmental Applications focuses on nanostructured control, synthesis methods, activity enhancement strategies, environmental applications, and perspectives of semiconductor-based nanostructures. The book offers future guidelines for designing new semiconductor-based photocatalysts, with low cost and high efficiency, for a range of products aimed at environmental protection. The book covers the fundamentals of nanotechnology, the synthesis of nanotechnology, and the use of metal oxide, metal sulfide, and carbon-based nanomaterials in photocatalysis. The book also discusses the major challenges of using photocatalytic nanomaterials on a broad scale. The book then explores how photocatalytic nanomaterials and nanocomposites are being used for sustainable development applications, including environmental protection, pharmaceuticals, and air purification. The final chapter considers the recent advances in the field and outlines future perspectives on the technology. This is an important reference for materials scientists, chemical engineers, energy scientists, and anyone looking to understand more about the photocatalytic potential of nanomaterials, and their possible environmental applications. Explains why the properties of semiconductor-based nanomaterials make them particularly good for environmental applications Explores how photocatalytic nanomaterials and nanocomposites are being used for sustainable development applications, including environmental protection, pharmaceuticals, and air purification Discusses the major challenges of using photocatalytic nanomaterials on a broad scale